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Helpline no. 0129-4259000

Helpline no. 0129-4259000

            ADMISSION_BROCHURE ONLINE COURSES

RF-magnetron Sputtering unit  Model- SAI-300

Specifications

RF-Power – 300 W

Target Diameter: 2 inches 

Substrate to target distance: 8 inches

Substrate heating: 250 0C

Substrate Rotation: 200 rpm.

Pump: Rotary and Diffusion 

Vacuum: 2×10-6  

Applications:

  • Fabrication of Nano-structured thin films and coatings ( 1 nm to hundreds of nm).
  • Preparation of Li and Na battery electrodes.
  • Preparation of Solar cell devices . 
  • Deposition of Multi-layers for magnetic tunnel junctions. 
  • Fabrication of optical planar waveguides and photonic microcavities operating in the visible and NIR regions. 
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